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UV Cleaning Machine
UV Cleaning Machine

UV Cleaning Machine

Description

The Laboratory Ultraviolet Ozone Cleaner Can Be Used To Remove Organic Pollutants On Most Inorganic Substrates Such As Quartz, Silicon Wafers, Gold, Nickel, Aluminum, Gallium Arsenide, Aluminum Oxide, Etc. It Provides An Efficient And Precise Cleaning Method. A Very Important Technology For Surface Modification. Laboratory Ultraviolet Ozone Cleaning Machine Can Be Commonly Used For Scanning Probe Microscope Samples, Used To Clean Atomic Force Microscope Probes, Scanning Probe Microscope Standards And Conventional Oily Layer And Residual Inorganic Materials On The Surface, And Can Also Be Used To Change The Hydrophobicity Of The Surface Of The Object It Is Helpful For The Chemical Modification Of Parts And Surfaces. The Oxidized And Hardened Probe Is Helpful To Maintain The Geometry Of The Probe During The Scanning Process, And The Sharpened Probe Is Helpful To Improve The Lateral Resolution.

Details Description

Laboratory Ultraviolet Ozone Cleaning Machine Is A Compact Ultraviolet Ozone Cleaning Machine, Which Is A System Specially Used To Remove Various Contaminants On The Surface Of Substrate Samples. Ultraviolet Ozone Cleaner Is A Simple And Easy-To-Use Dry Process, And It Is An Efficient Way To Clean The Surface. The Cleaning Effect Is Caused By Irradiating The Surface Of The Substrate With A Suitable Lamp, Which Generates Enough Energy In The Ultraviolet Spectrum. It Is A Photosensitized Oxidation Process Of Atomized Oxygen And Highly Active Ozone. UV Radiation Directly To The Surface Stimulates The Reaction To Produce Volatile Hydrocarbon Products. The Removal Of Nanometer-Thick Hydrocarbons Through Oxidation Leads To An Ultra-Clean Surface With Significant Wettability. This Is Very Important Before The Thin Film Coating Process On Glass And Ceramic Surfaces.

Product Features Of Laboratory Ultraviolet Ozone Cleaning Machine

  • Remove Various Contaminants From The Surface Of The Substrate Sample
  • Use A Dry Process To Clean The Surface In An Efficient Way
  • Generate Energy On The Wave Line Between 254nm And 185nm
  • With Oxygen Inlet, Ozone Removal Pump, LCD Unit
  • Sample Temperature Measurement Function
  • Buzzer To Indicate The Completion Of Cleaning
  • The Lock Function Used To Lock The Sample Tray To Avoid Opening During Operation

Specification Of UV-Ozone Cleaner

Input PowerAC 110V Or AC 208~240V (Please Select The Voltage In The Option Bar)
UV LampSolid Metal Double Wave Mercury Lamp UV Lamp Power: 55 Max.Wave Length: 254 Nm And 185 Nm UV Lamp Service Life:2500 HrsUV Light Area: 100 X 100 Mm ( 4″X4″)PEAK UV INTENSITIES:4.6 Milliwatts/Cm2.
Chamber & Sample StageOverall Dimensions:   9 1⁄2” X 7 7/8” X 6” Drawer Dimensions: 5 1⁄4”” X 51⁄4” X 1” Distance From Drawer To Lamp: 1 1/16”Distance From Pedestal To Lamp: 5/16”Pedestal:  4” X 4” X 3⁄4”18 Gauge Steel Chassis And Cover, Powder Coated Finish Total Weight: 9 Lbs.
ComplianceCE Certified
WarrantyOne Year Limited Warranty With Lifetime Support ( No Warranty For Pyrex Glass Chamber )
ENVIRONMENTAL REQUIREMENTIndoor Use Only; Altitude Use Up To 5,562 Feet;Temperature Range 41-104 Degrees Fahrenheit;Maximum Relative Humidity 80%, Up To 87 Degrees Fahrenheit Decreasing Linearly To 50% Relative Humidity At 104 Degrees Fahrenheit;Main Power Supply Fluctuations Not To Exceed 10% Of The Nominal Voltage; Overvoltage Category II;Pollution Degree 2; Ozone Level (Ambient) Measurement At <45 Ppb.
ApplicationCleaning Molecular Contamination From SPTs, AFM Tips And SurfacesCuring UV-AdhesivesUV Photopatterning Of SAM SurfacesOxidizing PDMSSurface SterilizationEtch, Pattern, SharpenClean MEMS DevicesClean Substrate Surface, Such As Si, Ge , GaAs And All Oxide Crystal  Substrate
Consumption PartsReplacement Lamps

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