Description

The Dual-Target Magnetron Sputtering Coating Equipment Is A Cost-Effective Magnetron Sputtering Coating Equipment Independently Developed By Our Company, Which Has The Characteristics Of Standardization, Modularization And Customization. Magnetron Targets Are Available In 1 Inch And 2 Inches, Customers Can Choose According To The Size Of The Plated Substrate; The Power Supply Is 300W RF Power Supply Plus 500W DC Power Supply, DC Power Supply Can Be Used For The Preparation Of Metal Film, RF Power Supply Can Be Used For Non-Metal For Film Preparation, Two Targets Can Meet The Needs Of Multi-Layer Or Multiple Coatings. If Customers Have Other Coating Needs, They Can Customize DC Power Supply And Pulse Power Supply. Various Types Of Power Supplies Are Available In Various Specifications From 300W To 1000W.